Perlast® G75H

About
Perlast® G75H incorporates a novel reinforcement system which produces a synthetically clean compound formulated for minimum particle generation combined with excellent resistance to aggressive oxygen and fluorine based plasmas. Specially developed for Plasma and Gas Deposition applications including ashing, etching, HDPCVD, PECVD, SACVD. Particularly suited for use in applications which require exposure to temperatures of up to 320°C (608°F) combined with excellent mechanical properties. Key Attributes Excellent plasma resistance High temperature stability Wide chemical resistance Low out-gassing properties making it ideal for vacuum applications Ultra low metal ion content Low coefficient of thermal expansion Outstanding physical properties make G75H ideal for dynamic applications. Typical Applications Dynamic seals Static seals Other components&&

Product Description
GenericPFE
Material StatusCommercial: Active
FeaturesLow CLTE,High Heat Resistance,Low odor,Solvent resistance,Heat Stabilized
AvailabilitysNorth America,Asia Pacific,Europe

Technical Data
MECHANICALNominal valueUnitTest method
Shore hardness
Shaw’s A80 ASTM D2240
IRHD hardness74 ASTM D1415 , ISO 48

elastic bodyNominal valueUnitTest method
tensile strength
yield18.1MPaASTM D412 , ISO 37
100% strain9.00MPaASTM D412 , ISO 37
Tensile strain
fracture220%ASTM D412,ISO 37
Compression deformation
200℃,72 hr18%ASTM D395,ISO 815

THERMALNominal valueUnitTest method
Maximum operating temperature320
Linear coefficient of thermal expansion3.00E-4 

Notes
1. Typical properties: these are not to be construed as specifications.
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