Kimura® K13X

About
A dark brown high performance polymer containing a unique self- reinforcing polymer structure, developed specifically for critical semiconductor applications. The high purity of the polymer combined with the absence of any fillers makes this polymer suitable for processes involving lower feature sizes. This material has a low coefficient of thermal expansion, low compression set and has an extremely low etch rate in aggressive plasma environments. Key Attributes Exceptionally pure – does not contain any fillers which may cause particulation problems. Outstanding plasma resistance – ideal for Chlorine, Fluorine & Oxygen chemistries. Exceptionally low plasma etch rate Low thermal expansion Retro-fits existing O-ring grooves (including FKM & FFKM grooves) Low permeation Low out-gassing Low adhesion (reduced sticking) Low friction, high strength and high modulus make K13X ideal for constant force dynamic applications. Typical Applications Dynamic seals Static seals Wafer-handling products&&

Product Description
Generic特殊弹性体
Material StatusCommercial: Active
FeaturesGood Rigidity,Low CLTE,High purity,Good Dimensional Stability,Low coefficient of friction,Low odor
AvailabilitysNorth America,Asia Pacific,Europe

Technical Data
elastic bodyNominal valueUnitTest method
tensile strength
yield23.0MPaASTM D412 , ISO 37
100% strain13.8MPaASTM D412 , ISO 37
Tensile strain
fracture160%ASTM D412,ISO 37
Compression deformation
204℃,72 hr28%ASTM D395,ISO 815

THERMALNominal valueUnitTest method
Maximum operating temperature280
Linear coefficient of thermal expansion2.18E-4 

MECHANICALNominal valueUnitTest method
Shore hardness
Shaw’s A80 ASTM D2240 , ISO 7619
IRHD hardness79 ASTM D1415 , ISO 48
friction coefficient 
Static @ 150 ℃/302 ° F0.44 
Static @ room temperature, 21 ℃/70 ° F0.35 

Notes
1. Typical properties: these are not to be construed as specifications.
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